Giant dielectric permittivity and electromechanical strain in thin film materials produced by pulsed-laser deposition

Vrejoiu, I.; Pedarnig, J.D.; Bäuerle, D.; Dinescu, M.
September 2003
Applied Physics Letters;9/15/2003, Vol. 83 Issue 11, p2130
Academic Journal
Thin film materials with a giant dielectric permittivity [variant_greek_epsilon][sub r][sup ′]≈10 000 and an electromechanical strain of Δh/h≈8% are produced by pulsed-laser deposition. Composite targets containing various different oxides such as BaTiO[sub 3], BaO[sub 2], BaCO[sub 3], and TiO[sub 2] powder embedded in the polymer polytetrafluoroethylen (PTFE) are employed for laser ablation. The dielectric permittivities of the films show strong relaxation at frequencies above 10 kHz, a pronounced dependence on layer thickness, and a frequency-dependent activation at lower temperatures. Composite targets as well as films produced from BaF[sub 2]/PTFE targets show only low permittivities with [variant_greek_epsilon][sub r][sup ′]<20 and do not reveal such phenomena. © 2003 American Institute of Physics.


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