TITLE

Electron-beam-induced deposition using a subnanometer-sized probe of high-energy electrons

AUTHOR(S)
Mitsuishi, K.; Shimojo, M.; Han, M.; Furuya, K.
PUB. DATE
September 2003
SOURCE
Applied Physics Letters;9/8/2003, Vol. 83 Issue 10, p2064
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Electron-beam-induced deposition was performed to fabricate nanostructures using a subnanometer-sized probe of high-energy electrons emitted by a 200 kV transmission electron microscope equipped with a field emission gun. We fabricated nanometer-sized dots with a diameter of less than 5 nm, controlling their position and size by the introduction of a organometallic precursor gas near the substrate surface. The relation between the size of the deposit and the deposition time was studied, and, in addition, the effect of the substrate thickness was examined. © 2003 American Institute of Physics.
ACCESSION #
10719101

 

Related Articles

  • Electron Beam Melting, Refining and Coatings--State of the... Bakish, R. // Industrial Heating;Sep96, Vol. 63 Issue 9, p79 

    Part I. Presents a `Tutorial Session' consisting of four papers which review the fundamentals relevant to electron beams featured in the `Electron Beam Melting, Refining and Coatings--State of the Art 1995' conference in Reno, Nevada. Areas about electron beams that were covered by the papers;...

  • Resonance splitting effect and wave-vector filtering effect in magnetic superlattices. Guo, Yong; Gu, Bing-Lin; Zhi-Qiang Li; Jing-Zhi Yu; Kawazoe, Yoshiyuki // Journal of Applied Physics;4/15/1998, Vol. 83 Issue 8, p4545 

    Provides information on a study investigating the resonance splitting and wave-vector filtering for electron tunneling through magnetic superlattices. Methodology used to conduct the study; Results of the study; Discussion on the results.

  • The effect of thermal annealing on the Ni/Au contact of p-type GaN. Sheu, J.K.; Su, Y.K.; Chi, G. C.; Chen, W.C.; Chen, C.Y.; Huang, C.N.; Hong, J.M.; Yu, Y.C.; Wang, C.W.; Lin, E.K. // Journal of Applied Physics;3/15/1998, Vol. 83 Issue 6, p3172 

    Presents a study which focuses on the preparation of the Ni/Au layers through the use of the electron beam evaporation and thermal alloying on the contact of p-type GaN. What the x-ray diffraction measurements indicated; Reference to the study of the diffusing behavior of both Ni and Au.

  • Theory and Design of Thermionic Electron Beam Guns.  // AIP Conference Proceedings;2007, Vol. 888 Issue 1, p411 

    A correction to the article "Theory and Design of Thermionic Electron Beam Guns," which appeared in the March 17, 2005 issue, is presented.

  • Spatial-phase locking with shaped-beam lithography. Hartley, John G.; Groves, Timothy R.; Smith, Henry I.; Mondol, Mark K.; Goodberlet, James G.; Schattenburg, Mark L.; Ferrera, Juan; Bernshteyn, Alexandr // Review of Scientific Instruments;Mar2003, Vol. 74 Issue 3, p1377 

    Spatial-phase-locked electron-beam lithography is a method of precisely locating pattern elements on a substrate by providing real-time feedback of the beam's location by means of a fiducial grid located on the substrate surface. Previously, this technique has been demonstrated in Gaussian-beam...

  • Weld precision taken to the next level.  // Laboratory News;Jul2015, p6 

    The article focuses on the development by scientists at the TWI research organisation and the University of Cambridge of a welding technique that can produce precise joints by using electron beam lithography and a laser.

  • Electron beam sterilization of PET and HDPE bottles.  // Canadian Plastics;Apr2010, Vol. 68 Issue 2, p5 

    The article evaluates the e25ITB electron beam emitter from Advanced Electron Beams.

  • Cleaner bottles in a zap.  // Inc.;Apr2010, Vol. 32 Issue 3, p42 

    The article evaluates a compact electron-beam emitter from Advanced Electron Beams.

  • Linewidth limits in free-electron lasers caused by sidebands. Riyopoulos, Spilios // Physics of Plasmas;Sep94, Vol. 1 Issue 9, p3078 

    Studies the linewidth limits in free-electron lasers caused by sidebands. Steady-state bunched beam distribution; Sideband growth rate computation; Sideband stability far from the carrier.

Share

Read the Article

Courtesy of VIRGINIA BEACH PUBLIC LIBRARY AND SYSTEM

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics