Kinetic control of a particle by voltage sequence for a nonimpact electrostatic micromanipulation

Saito, Shigeki; Himeno, Hideo; Takahashi, Kunio; Urago, Masataka
September 2003
Applied Physics Letters;9/8/2003, Vol. 83 Issue 10, p2076
Academic Journal
This letter describes a calculation of a voltage sequence to obtain kinetic control of a particle for nonimpact electrostatic micromanipulation. The system consists of conductive objects: A manipulation probe, a spherical particle, and a substrate plate. The particle, initially adhering to the probe tip, is detached by an applied voltage. The electrostatic force acting on the particle during its movement to the substrate is calculated by a numerical boundary element method. We determine the voltage and time sequence for nonimpact deposition of the particle onto the substrate by considering the total work to the particle. The calculation provides the power source requirements for nonimpact particle deposition. © 2003 American Institute of Physics.


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