Field emission from carbon black and carbon black/silica nanoparticles dispersed in photoresist

Busta, H.; Boidridge, D.; Myers, R.; Edwards, E.; Feinerman, A.
September 2003
Applied Physics Letters;9/1/2003, Vol. 83 Issue 9, p1779
Academic Journal
Carbon black and carbon black mixed with silica nanoparticles were dispersed in Shipley 1818 photoresist and spun onto copper-coated silicon substrates. By using an appropriate amount of carbon black, the films are made conductive, at least in the vertical direction, and exhibit electron emitting properties with macroscopic current densities of about 1 mA/cm[sup 2] and turn-on fields ranging from 3 to 5 V/μm. These results are compared to carbon nanotubes (CNTs) also dispersed in photoresist and prepared in a similar manner. The current-extraction field curves exhibit a pronounced peak for the C/SiO[sub 2] sample and saturation regions for the C and CNT samples. It is conjectured that resonance tunneling caused by the presence of impurities gives rise to this behavior. The maximum deposition temperature these films experience is 120 °C, which makes them ideal candidates for low-cost, large-area electron and x-ray sources. The role of the photoresist is mainly for providing adhesion of the carbonaceous material to the substrate. © 2003 American Institute of Physics.


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