TITLE

Off-axis illumination

AUTHOR(S)
Mack, Chris A.
PUB. DATE
August 2003
SOURCE
Microlithography World;Aug2003, Vol. 12 Issue 3, p14
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Discusses ways of optimizing annular and quadrupole types of off-axis illumination (OAI) to maximize the depth of focus (DOF) for a given pitch. Background on the contributions of OAI to the application of optical lithography; Importance of mask patterns in integrated circuit designs; Significance of quadrupole illumination in creating the proper angles for the orientation of lines.
ACCESSION #
10528290

 

Related Articles

  • Optical lithography below 100 nm. Bruning, John H. // Solid State Technology;Nov98, Vol. 41 Issue 11, p59 

    Part II. Studies the developments in optical lithography technology for the production of integrated circuits (IC). Alternatives for leveraging optical technology; Performance of lithographic lenses; Development of higher-resolution lenses.

  • Immersion Lithography Taps Into Water For Better Resolution.  // Electronic Design;1/20/2003, Vol. 51 Issue 2, p30 

    Focuses on the immersion lithography technique using transparent liquid for designing integrated circuits. Effect of using transparent liquid on resolution of the lens; Impact of resolution enhancement on dimensions of transistors in chips; Efforts of the Austin, Texas-based organization...

  • Optical lithography: Lithography at EUV wavelengths. Tallents, Greg; Wagenaars, Erik; Pert, Geoff // Nature Photonics;Dec2010, Vol. 4 Issue 12, p809 

    The article discusses on the extreme-ultraviolet (EUV) lithography to be introduced in the semiconductor chip manufacturing. It describes the characteristics of EUVs including easy absorption by air, optical elements needed to be reflective, and need for a bright light source. It states that the...

  • Mask rule standards: A baby step for DfM. Mason, Mark // Microlithography World;May2006, Vol. 15 Issue 2, p4 

    Features the standardized mask design rules (MDR) for the manufacturing of integrated circuits. Challenges facing a photomask manufacturing facility; Definition of MDR; Tools utilized by the mask manufacturing process.

  • Fabrication at the Nano Scale with Molds and Imprinting. Law, Jaslyn B. K. // American Scientist;May/Jun2015, Vol. 103 Issue 3, p212 

    The article focuses on research into nanofabrication methods. It states that two top-down approaches to nanofabrication, optical lithography and nanoimprint lithography, have been shown to work well and mentions that optical lithography is the dominant patterning method for semiconductor...

  • The death of the aerial image. Mack, Chris A. // Microlithography World;Aug2005, Vol. 14 Issue 3, p12 

    Focuses on the aerial image in semiconductor lithography. Information on aerial image, the image of a photomask projected onto the plane of the wafer; Effects of high numerical-aperture (NA) on imaging; Determination of the amount of interference between two electric fields; Reason behind the...

  • Photoblanks for advanced lithography. Walton, Robin // Solid State Technology;Oct2003, Vol. 46 Issue 10, p26 

    Investigates how commercially available coatings meet the requirements of coatings for advanced photomasks. Effects of stress birefringence and refractive index homogeneity on the image quality and productivity of optical lithographic step-scan systems; Requirements for preparing absorber and...

  • Advanced Mask Inspection and Metrology. Yoshioka, Nobuyuki; Terasawa, Tsuneo // AIP Conference Proceedings;2003, Vol. 683 Issue 1, p389 

    Lithography is one of the most important semiconductor micro-fabrication technologies that form mask pattern images onto the substrate. Since a mask is the original edition of semiconductor patterns, precise control of the mask aperture size becomes critical. The masks have to be made up in the...

  • Light-coupling masks for lensless, sub-wavelength optical lithography. Schmid, Heinz; Biebuyck, Hans; Michel, Bruno; Martin, Olivier J. F. // Applied Physics Letters;5/11/1998, Vol. 72 Issue 19 

    Light-coupling masks (LCMs) based on structured organic polymers that make conformal contact with a substrate can constitute an amplitude mask for light-based lithographies. The LCM is exposed through its backside, from where the light is differentially guided by the structures towards the...

Share

Read the Article

Courtesy of

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics