Off-axis illumination

Mack, Chris A.
August 2003
Microlithography World;Aug2003, Vol. 12 Issue 3, p14
Trade Publication
Discusses ways of optimizing annular and quadrupole types of off-axis illumination (OAI) to maximize the depth of focus (DOF) for a given pitch. Background on the contributions of OAI to the application of optical lithography; Importance of mask patterns in integrated circuit designs; Significance of quadrupole illumination in creating the proper angles for the orientation of lines.


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