Making 50nm contact holes with DUV

Suhm, Karen; Baker, Dan; Hesse, Brian; Clark, Kevin; Coleman, Scott
August 2003
Microlithography World;Aug2003, Vol. 12 Issue 3, p4
Trade Publication
Presents a study that examined the production of 50-nanometer (nm) contacts with reasonable processing latitudes using 248nm lithography and a binary mask. Information on resist and substrate selection; Details of the mask and aperture optimization; Application of several techniques in post-develop shrink processing.


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