TITLE

Photorefractive lithography with synchrotron light in poly(methyl methacrylate)

AUTHOR(S)
Andreas, B.; Peithmann, K.; Soergel, E.; Buse, K.
PUB. DATE
August 2003
SOURCE
Applied Physics Letters;8/11/2003, Vol. 83 Issue 6, p1116
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Synchrotron light changes the refractive index of poly(methyl methacrylate) (PMMA). Refractive-index enhancements as well as reductions depending on dose and energy of the radiation used can be observed. This effect allows the manufacturing of, for example integrated-optical components, as is demonstrated by realization of waveguides in PMMA. © 2003 American Institute of Physics.
ACCESSION #
10465408

 

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