TITLE

Photomask Industry Needs to Integrate Across Litho Plane

PUB. DATE
June 2003
SOURCE
Electronic News;6/30/2003, Vol. 49 Issue 26, pN.PAG
SOURCE TYPE
Trade Publication
DOC. TYPE
Article
ABSTRACT
Presents information on the actions that should be taken by the U.S. photomask industry to see integration across the lithography plane, highlighted at the Advanced Reticle Symposium 2003. Benefits of integrating the lithography plane; Means to address the escalating costs of decreasing geometries.
ACCESSION #
10457090

 

Related Articles

  • Stylus nanoprofilometry for mask metrology. Moloni, Katerina; Morrison, Troy // Microlithography World;Aug2004, Vol. 13 Issue 3, p18 

    Examines the characterization of three-dimensional structures of advanced reticles using a stylus nanoprofilometer (SNP) photomask metrology. Way of extending the capability of lithography steppers; Background on SNP; Requirements for measuring critical dimensions. INSET: Extracting profile...

  • Growth Returns to Photomask Market. Romanelli, Alex // Electronic News;6/30/2003, Vol. 49 Issue 26, pN.PAG 

    Presents an economic outlook for the U.S. photomask industry, highlighted at the Advanced Reticle Symposium 2003. Actions that should be taken to the help the survival of nano-imprint and other technologies and revenue growth; Overview of the alleged technological failure being faced by...

  • Elusive mask defects: The false defect. Reynolds, James A. // Solid State Technology;Feb95, Vol. 38 Issue 2, p81 

    Focuses on the false or nuisance defect in photomasks. Effect on the speed, sensitivity and accuracy of die-to-database reticle inspection; Specification of how many nuisance defects must be separated from real defects during the defect classification process; Fracturing of the mask design data...

  • Do Maskmakers Need Uncle Sam? Chappell, Jeff // Electronic News;7/1/2002, Vol. 48 Issue 27, p10 

    Talks about the U.S. reticle business as of 2002. Idea of government involvement in the business; Cost of photomask overhead; Institute approach to technology research and development; Functions of the National Nanotechnology Initiative.

  • Fab planning.  // Solid State Technology;May2002, Vol. 45 Issue 5, p62 

    Deals with the increased sensitivity of reticles to handling and other damages. Use of automated reticle sorting, stocking and delivery systems in fabs.

  • Mask gate CD variations reduced with double-step maskmaking*. Lee, Il-Ho; Kozuma, Makoto // Solid State Technology;Jul2001, Vol. 44 Issue 7, p203 

    Describes a double-step maskmaking process that reduces pattern density variation across a reticle plate when making line patterns in an active region. Causes of critical dimension (CD) variation in lithography processing; Issue in improving reticle CD errors; Test to determine the effect of...

  • Method for repairing Mo/Si multilayer thin film phase defects in reticles for extreme ultraviolet lithography. Mirkarimi, P. B.; Stearns, D. G.; Baker, S. L.; Elmer, J. W.; Sweeney, D. W.; Gullikson, E. M. // Journal of Applied Physics;1/1/2002, Vol. 91 Issue 1, p81 

    The development of a nearly defect-free reticle blank is an important challenge facing extreme ultraviolet lithography (EUVL). The core element of an EUVL reticle blank is the reflective Mo/Si multilayer film, and deposition of Mo/Si on very small substrate defects can result in critical Mo/Si...

  • KLA-Tencor Launches Photomask Verification System.  // Electronic News;5/12/2003, Vol. 49 Issue 19, pN.PAG 

    Reports on the introduction of the Process Window Qualification (PWQ) reticle design verification system from KLA-Tencor. Functions of the PWQ; Statement from Burn Lin of Taiwan Semiconductor Manufacturing Co. about the extension of the optical lithography to the 90 nanometer node; Key features...

  • Keep Your M145's Light Shining.  // PS: Preventive Maintenance Monthly;Jul2006, Issue 644, p17 

    The article provides information on the light of the M145 machine gun optic. It states that machine guns have illuminated reticle for low-light sighting. It instructs machine gunners to turn the rotary switch to off when reticle light is not needed. It also reminds the gunner that the reticle...

Share

Read the Article

Courtesy of VIRGINIA BEACH PUBLIC LIBRARY AND SYSTEM

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics