TITLE

Mesoscale x-ray diffraction measurement of stress relaxation associated with buckling in compressed thin films

AUTHOR(S)
Goudeau, Philippe; Villain, Pascale; Tamura, Nobumichi; Padmore, Howard A.
PUB. DATE
July 2003
SOURCE
Applied Physics Letters;7/7/2003, Vol. 83 Issue 1, p51
SOURCE TYPE
Academic Journal
DOC. TYPE
Article
ABSTRACT
Compressed thin films deposited on substrates may buckle depending on the geometrical and mechanical properties of the film/substrate set. Until recently, the small dimensions of the buckling have prevented measurements of their local in plane internal stress distribution. Using a scanning x-ray microdiffraction technique developed at a third generation x-ray synchrotron source, we obtained thin film internal stress maps for circular blisters and telephone chord buckling with micrometric spatial resolution. A fair agreement was found between the film delamination topology observed by optical microscopy and the measured stress maps. We evidenced residual stress relaxation associated with the film buckling: the top is essentially stress free while adherent region exhibits large compressive stresses.
ACCESSION #
10143766

 

Related Articles

  • A simplified analysis on buckling of stressed and pressurized thin films on substrates. Wu, Baisheng; Yu, Yongping // Archive of Applied Mechanics;Feb2014, Vol. 84 Issue 2, p149 

    This paper is concerned with effect of mismatched pressure on buckling of stressed thin films on a semi-infinite rigid substrate. Analytical approximate solutions are established in explicit form by using total potential energy of the system and the Rayleigh-Ritz's method, and their stabilities...

  • The nanoindentation applied to predict the interface delamination for the C/amorphous Si composite film. Han, Chang-Fu; Huang, Chao-Yu; Wu, Bo-Hsiung; Lin, Jen-Fin // Journal of Applied Physics;Oct2009, Vol. 106 Issue 8, p083517 

    In the present study, the indentation depth corresponding to the pop-in arising in the loading process is found to be quite close to the C/amorphous Si composite film thickness, regardless of the C-film thickness. This load-depth behavior gives a clue that the occurrence of pop-in is perhaps...

  • Calculations of Buckle-Driven Delamination Using Cohesive Elements. Corona, Edmundo; Reedy, E. // International Journal of Fracture;Aug2011, Vol. 170 Issue 2, p191 

    Plane strain, elastic calculations of buckle-driven thin film delamination from compliant substrates using finite element models are considered. The interfacial properties between the film and the substrate are modeled using cohesive elements with a tractionseparation law formulated in terms of...

  • On the mechanical strength of free-standing and substrate-bonded Al thin films. Heinen, D.; Bohn, H. G.; Schilling, W. // Journal of Applied Physics;4/15/1995, Vol. 77 Issue 8, p3742 

    Provides information on a study that compared the flow stress of identically prepared substrate bonded and free-standing aluminum films. Methodology of the study; Results and discussion on the study.

  • The dynamic competition between stress generation and relaxation mechanisms during coalescence of Volmer-Weber thin films. Floro, J. A.; Hearne, S. J.; Hunter, J. A.; Kotula, P.; Chason, E.; Seel, S. C.; Thompson, C. V. // Journal of Applied Physics;5/1/2001, Vol. 89 Issue 9, p4886 

    Real-time measurements of stress evolution during the deposition of Volmer-Weber thin films reveal a complex interplay between mechanisms for stress generation and stress relaxation. We observed a generic stress evolution from compressive to tensile, then back to compressive stress as the film...

  • The effect of applied strain on the resistance of VO[sub 2] thin films. Gregg, J.M.; Bowman, R.M. // Applied Physics Letters;12/22/1997, Vol. 71 Issue 25, p3649 

    Investigates the effect of applied strain on the resistance of vanadium dioxide thin films. Synthesis of the films by pulsed laser deposition; Measurement of the electrical characteristics of the films; Effect of integrating strictive materials as substrates for vanadium dioxide overlayers.

  • A simple technique for the determination of mechanical strain in thin films with applications to polysilicon. Guckel, H.; Randazzo, T.; Burns, D. W. // Journal of Applied Physics;3/1/1985, Vol. 57 Issue 5, p1671 

    Features a study that proposed a technique for the determination of mechanical strains in thin films with built-in compressive strain fields. Importance of strain fields and their uncertain origin; Relationship between buckling load, beam geometry and material parameters; Application to...

  • Elastic silicon-film-based nanoshells: Formation, properties, and applications. Prinz, V.; Golod, S. // Journal of Applied Mechanics & Technical Physics;Nov2006, Vol. 47 Issue 6, p867 

    Controllable formation and properties of solid single-crystal micro-and nanoshells of various shapes (tubes and spirals, vertically positioned rings and cylinders, and bent and trough-shaped cantilevers) are briefly reviewed, and new results are given. The shells and complicated structures of...

  • The Mechanical Behavior of Nanoporous Gold Thin Films. Ye Sun; Jia Ye; Zhiwei Shan; Minor, Andrew M.; Balk, T. John // JOM: The Journal of The Minerals, Metals & Materials Society (TM;Sep2007, Vol. 59 Issue 9, p54 

    Thin films of nanoporous noble metals exhibit and interconnected, porous structure with ligament widths and pores on the order of 10 nm or higher. In this study, thin film stress measurements and in-situ nanoindentation in a transmission-electron microscope were performed to investigate the...

Share

Read the Article

Courtesy of VIRGINIA BEACH PUBLIC LIBRARY AND SYSTEM

Sorry, but this item is not currently available from your library.

Try another library?
Sign out of this library

Other Topics